KOH & Chemical-Resistant Filtration
Filter media and elements engineered to withstand caustic, acidic and aggressive process media — including KOH electrolyte.

Aggressive process media demand more than a standard filter. Caustic solutions such as potassium hydroxide (KOH), strong acids, solvents and oxidising agents attack conventional media and seals — leading to premature failure and contamination. R+F FilterElements develops chemically resistant filter media and elements with the right polymer selection, surface treatment and sealing system, so your filtration stays reliable even under the harshest chemistry.
KOH & caustic ready
Media engineered to resist potassium hydroxide and other caustic electrolytes used in alkaline electrolysis.
Acid & solvent resistant
Polymer selection for strong acids, solvents and oxidising process media.
Matched sealing systems
Seals and finishing chosen to match the chemistry — not just the filter medium.
Chemical resistance is a system property. A filter that survives an aggressive medium needs the right combination of filter medium, support structure, sealing material and finishing — all chosen for the specific chemistry, temperature and concentration. A single weak component compromises the whole element.
R+F FilterElements develops chemically resistant filtration from the material up. With direct access to a broad range of raw materials, we select and combine polymers and textiles for exactly your process. For technical filter fabrics and media we also operate a dedicated specialist website with the full material programme.
Go to the matching specialist solution
Find detailed product and application information on our dedicated specialist website.
Explore Filter Fabrics & MediaRelated Topics
Frequently Asked Questions
Which chemicals can your filter media withstand?
Depending on the selected polymer and finishing, our media resist caustic solutions such as KOH and NaOH, strong acids, many solvents and oxidising agents. We match the material to your specific chemistry, temperature and concentration.
Is chemical resistance only about the filter medium?
No. Resistance is a system property — the medium, support, seals and finishing must all suit the chemistry. We engineer the complete element accordingly.
Talk to our engineers
Describe your process conditions — we will develop the matching filtration solution.
